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Impacts of localized charge accumulation on photocurrent dynamics in metal−MoS2 contacts Deogkyu Choi, Seungho Bang, Juchan Lee, Chaewon Lee, Jieun Jo, Young Joo Yu, Chan Kwon, Hayoung Ko, Ki Kang Kim, Jinho Ahn*, Eun Kyu Kim*, Mun Seok Jeong*, Nanoscale, 28, 12 June, 16775 (2025)
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Vertically Integrated In-Sensor Processing System Based on Three-Dimensional Reservoir for Artificial Tactile System Taeseung Jung, Dohan Kim, Giuk Kim, Seungyeob Kim, Hyojun Choi, Minyoung Jo, Yunjeong Kim, Jinho Ahn, Seong-Ook Jung*, Sanghun Jeon*, ENERGY & ENVIRONMENTAL MATERIALS, 12 January, 70063 (2025)
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Ultralow line edge roughness of hybrid multilayer Extreme ultraviolet resist with vertical molecular wire structure Jaehyuk Leea, Hyeonseok Jia, Chawon Koha, Juyeong Leea, Ji-Hoo Seok, Jinho Ahn, Chang Gyoun Kim, Jiho Kim, Inhui Hwang, Hyungju Ahn, Kug-Seung Lee, Sangsul Lee, Dimitrios Kazazis, Prajith Karadan, Yasin Ekinci, Gregory Denbeaux, Ji Young Park, Won-Joon Song, Seungmin Lee, Tsunehiro Nishi, Bruno La Fontaine, Myung Mo Sung*, Materials Today, 87, August (2025)
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Enhancing Program Speed and Diminishing Read After Write Delay by Metal Work Function Engineering Seokjoong Shin, Giuk Kim, Hyojun Choi, Sanghyun Park, Kwangyou Seo, Kwangsoo Kim, Wanki Kim, Daewon Ha, Jinho Ahn, Sanghun Jeon*, IEEE Electron Device Letters, 46(8) 18 June, (2025)
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Enhancement of performance and reliability in MOSFETs via high-pressure microwave annealing Geonhyeong Kang, Hunbeom Shin, Seungyeob Kim, Lingwei Zhang, Giuk Kim, Sujeong Lee, Yunseok Nam, Chaeheon Kim, Hoon Kim, Jinho Ahn, Sanghun Jeon*, Journal of Vacuum Science & Technology B, 43(1), 24 January, 012206 (2025)
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Imprinted Antiferroelectric With Low Damage Process for High Performance Negative Capacitance NAND Flash Memory Sangho Lee, Giuk Kim, Yunseok Nam, Yeongseok Jeong, Taeho Kim, Hunbeom Shin, Sangmok Lee, Jinho Ahn, Sanghun Jeon*, IEEE Electron Device Letters, 46(4), 04 February, 3538562 (2025)
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In Situ Analysis of Electron-Induced Chemical Transformations in Vapor-Phase-Synthesized Al-Based Inorganic–Organic Hybrid Thin Films for EUV Resist Platform Dan N. Le, Won-Il Lee, Su Min Hwang, Ashwanth Subramanian, Nikhil Tiwale, Jihoon Woo, Jean-Francois Veyan, Abdullah Al-Mahboob, Jerzy T. Sadowski, Jin-Hyun Kim, Thi Thu Huong Chu, Doo San Kim, Minjong Lee, Rino Choi, Jinho Ahn, Myung Mo Sung, Chang-Yong Nam,* Jiyoung Kim*, ACS Applied Materials & Interfaces, 17(12), 13 March (2025)
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Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types Seungchan Moon, Dong Gi Lee, Jinhyuk Choi, Junho Hong, Taeho Lee, Yasin Ekinci, Jinho Ahn*, photonics, 12(3), 14 March, 12030266 (2025)
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Improved Retention Characteristics of Z2-FET Employing Half Back-Gate Control S. Kwon, C. Navarro, F. Gamiz, P. Galy, S. Cristoloveanu, Life Fellow, Y.-T. Kim* and J. Ahn*, IEEE Transactions on Electron Devices, 68(3), 3 February, 3053514 (2021)
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A new route of synthesizing atomically thin 2D materials embedded in bulk oxides Jeongwoon Hwang*, Jongchan Kim, Yifan Nie, Byoung Hun Lee, Jinho Ahn, Jiyoung Kim, Myung Mo Sung and Kyeongjae Cho*, Journal of Applied Physics, 130 (3), 15 July, 0055054 (2021)
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Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings
Su Min Hwang, Harrison Sejoon Kim, Dan N. Le, Arul Vigneswar Ravichandran, Akshay Sahota, Jaebeom Lee, Yong Chan Jung, Si Joon Kim, Jinho Ahn, Byung Keun Hwang, Lance Lee, Xiaobing Zhou, Jiyoung Kim*, ACS Applied Nano Materials, 4(3), 22 February 0c03203 (2021)
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